Products    /    Lab Equipments   /    UV Laser Writing System for Photolithography 2
UV Laser Writing System
for Photolithography

Model: HO-LWS-PUV-T


    Laser :     405nm fiber coupled laser
    Focusing mode :     Microscope objective based
    Spot diameter :     <10um (depends on the objective magnification)
    Intensity :     3mW at the sample position
    Focusing :     Motorized, software controls

    Optical format :     1/2” CMOS
    Active imager size :     6.55 mm x 4.92 mm
    Active pixels :     2048 x 1536 (3MP)
    Pixel size :     3.2 um x 3.2 um
    Color filter array :     RGB Bayer pattern
    Shutter type :     Electronic rolling shutter (ERS)
    Frame rate :     Full resolution - up to 10fps, VGA - up to 26.7 fps
    Pixel dynamic range :     61 dB
    Operating temperature :     -30ºC to +70ºC
    Sensitivity :     >1.0V / lux-sec (550nm)
    Interface :     USB 2.0
    Spectral range :     380 nm - 650 nm
    Motorized XY-Theta sample stage
    XY travel :     100 mm x 100 mm
    XY resolution :     1 um
    Unidirectional repeatability :     3 um
    Positioning accuracy :     5 um
    Theta stage resolution :     0.1 degree
    Repeatability :     0.1 degree
    Positioning accuracy :     0.1 degree
    Vacuum sample chuck
    Nosepiece :     Quadruple, Motorized, Software controls
    Software :     Mach3 CNC software

    Microscope objectives
    1. Infinity Plan achromatic 60X objective
    N A :     0.75
    Working distance :     1.22 mm
    2. Infinity Plan achromatic 100X objective
    N A :     0.85
    Working distance :     0.4 mm


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