Rubbing Machine has been developed for LCD R&D Labs. The system is intended for tracing grooves on the polyimide to orient the liquid crystal molecules. The grooves are made using a special rubbing cloth having depth of a few Angstrom. The substrate is held by a vacuum chuck for which a vacuum pump is included and integrated with the system. Maximum size of glass substrate which can be loaded in Model: HO-IAD-BTR-02 is 200mm diameter. The substrate along with vacuum chuck is held on a rotation stage so that it can be rotated and positioned at any required angle from ±20 degrees for various rubbing orientations.
The system has been developed as a standalone unit in which speed of the spindle and speed of the substrate can be varied.
Rubbing machine is developed in technical collaboration with Professor Surajit Dhara, School of Physics, University of Hyderabad.
his personal website : www.surajitdhara.in
|● Substrate holder|
|a) Motorized linear stage for substrate movement|
|b) Actuated by stepper motor|
|c) Travel||:||300 mm|
|d) Minimum speed||:||0.05 mm / sec|
|Maximum speed||:||6 mm / sec|
|e) Maximum size of movable substrate plate||:||200 mm Dia.|
|f) Substrate fixed on a rotation stage which can be rotated +/- 45 degree|
|● Rubbing wheel actuator||:||Brushless DC motor with speed control|
|Maximum speed||:||3000 rpm|
|Minimum speed||:||0 rpm|
|● Display of speed on LCD screen|
|● Speed control of the spindle by a knob|
|● Input||:||230 VAC|
|● The System can be used in standalone mode|
Rubbing Machine has been developed for LCD R&D Labs. The system is intended for tracing grooves on the polyimide to orient the liquid crystal molecules.