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Near Normal Spectroscopic
Reflectometer

Model: HO-NNSR-01


Near Normal Spectroscopic Reflectometer is a fundamental instrument used for thin film thickness analysis for industry & research. Holmarc’s TFSR Model No: HO-NNSR-01 is able to analyze thin film’s thickness, complex refractive index & surface roughness with high speed & repeatability. TFSR theory works with complex matrix form of Fresnel equations for reflectance & transmittance. Absolute reflectance spectroscopy is the principle behind Reflectometer; which is the ratio of the intensity of the reflected light beam (usually monochromatic) to the intensity of the incident beam. Light beam which normally incidents on the sample surface in turn reflect from top & bottom of the thin film surfaces which get interfere & is directed through Optical fiber to CCD attached spectrometer via computer. On the monitor we get spectrogram with interference oscillations directly proportional to thin film thickness.

Holmarc’s Reflectometer can be used to analyze single, free standing & rough layer thickness of various stacks such as di-electric, crystalline, amorphous, metallic & absorbing samples. It also finds absolute transmittance & absorption directly (Customized). Roughness treatment is done with EMA modeling. It also finds Optical conductivity, molar Refractivity & Brewster’s angle of sample under study (Customized).




    Film Thickness range :     20 nm - 35 μm
    Reflectance Wavelength range :     400 nm - 850 nm
    Transmittance   /   Absorbance range :     0 - 100% (Customized)
    Light source :     Tungsten Halogen Quartz Lamp, 50W
    Detector :     CCD linear array, 3648 pixels
    Spectrometer :     Grating spectrometer
    Precision typically for SiO2 on NSF - 66 :     ± 1 nm
    Optical Power :     50 W
    Light spot size :     2 mm
    Optical fiber :     Multimode Bi-furcated fiber with SMA fiber coupler
    Reference Sample :     Polished NSF - 66 / Float Glass (Microscopic slide 1 mm)
    Standard Sample :     ITO thin film on float glass, SiO2 thin film on NSF - 66 Substrate
    Measuring modes :     Curve fitting / Regression Algorithms, FFT, FFT + Curve Fit
    Dispersion formulas :     Cauchy’s, Sellmeiers & Empirical Models
    EMA models :     Linear EMA, Bruggemann, Maxwell Garnett, Lorentz - Lorenz models
    Material Library :     Extendable Material user library
    PC Interface :     USB


Features

    Analyze single layer films

    Curve Fit / FFT based thickness meaurement

    Fiber optic probe for reflectance measurement at normal incident angle

    CCD linear array image sensor for simultaneous measurement of reflectance at each wavelength

    User extendable materials library

    Data can be saved as an Excel or text file

    Advanced mathematical fitting algorithm

    FFT based thickness measurement

    Extraction of thickness and optical constants

    Parameterized models




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